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1. 发明公开

EP3864469A1 FUSER STRIPPING MECHANISM WITH BEVELED TIP 审中-公开
公开(公告)号：EP3864469A1
公开(公告)日：2021-08-18
申请号：EP19831942.8
申请日：2019-09-24
申请人： Eastman Kodak Company
发明人： CAHILL, David F. , BOBO, Robert D. , ALLEN, Mark H.
IPC分类号： G03G15/20

2. 发明授权

EP3303685B1 FOAMED, OPACIFYING ELEMENTS AND METHODS OF MAKING 有权
公开(公告)号：EP3303685B1
公开(公告)日：2020-09-23
申请号：EP16731396.4
申请日：2016-05-23
申请人： Eastman Kodak Company
发明人： BRICK, Mary, Christine , NAIR, Mridula , LINDNER, Kimberly, S. , PYSZCZEK, Ellen, M. , MCHUGH, Tomas Gerard, Patrick , BESSEY, Peter, G.
IPC分类号： D06N3/00 , C09D5/32 , C08J9/30 , C09D7/65

3. 发明授权

EP3497106B1 SILVER ION CARBOXYLATE PRIMARY ALKYLAMINE COMPLEXES 有权
公开(公告)号：EP3497106B1
公开(公告)日：2020-05-13
申请号：EP17754864.1
申请日：2017-07-26
申请人： Eastman Kodak Company
发明人： SHUKLA, Deepak , LENHARD, Jerome, Robert , MIS, Mark , DONOVAN, Kevin, M. , WELTER, Thomas, Robert
IPC分类号： C07C59/01 , C07C59/08 , C07C211/07

4. 发明授权

EP2539924B1 VERTICAL TRANSISTOR INCLUDING REENTRANT PROFILE 有权
公开(公告)号：EP2539924B1
公开(公告)日：2019-12-11
申请号：EP11704703.5
申请日：2011-02-10
申请人： Eastman Kodak Company
发明人： TUTT, Lee William , NELSON, Shelby Forrester
IPC分类号： H01L21/336 , H01L29/786

5. 发明授权

EP3408098B1 NEGATIVELY-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD 有权
公开(公告)号：EP3408098B1
公开(公告)日：2019-11-06
申请号：EP17705978.9
申请日：2017-01-12
申请人： Eastman Kodak Company
发明人： HAYASHI, Koji , MATZ, James Russell , ISHII, Satoshi , SEKIGUCHI, Yoshiaki , KAMIYA, Masamichi
IPC分类号： B41C1/10

6. 发明授权

EP3110732B1 MEDIA GUIDING ROLLER USING BERNOULLI FORCE EFFECT 有权
公开(公告)号：EP3110732B1
公开(公告)日：2019-07-31
申请号：EP14830438.9
申请日：2014-12-18
申请人： Eastman Kodak Company
发明人： MUIR, Christopher M. , CORNELL, David J.
IPC分类号： B65H20/14 , B65H23/025 , B65H27/00 , B65H29/24 , B65H5/06 , B65H9/16

7. 发明授权

EP3110735B1 AIR SHOE WITH ROLLER PROVIDING LATERAL CONSTRAINT 有权
公开(公告)号：EP3110735B1
公开(公告)日：2019-05-22
申请号：EP14825018.6
申请日：2014-12-15
申请人： Eastman Kodak Company
发明人： CORNELL, David J. , MUIR, Christopher M. , ARMBRUSTER, Randy E.
IPC分类号： B65H23/24 , B41J15/04

8. 发明授权

EP2714405B1 SYSTEM AND METHOD FOR LIQUID EJECTION 有权
公开(公告)号：EP2714405B1
公开(公告)日：2018-10-24
申请号：EP12727462.9
申请日：2012-05-23
申请人： Eastman Kodak Company
发明人： PANCHAWAGH, Hrishikesh, V. , MARCUS, Michael, Alan , KATERBERG, James, A.
IPC分类号： B41J2/08 , B41J2/115
CPC分类号： B41J2/08 , B41J2/115
摘要： A continuous liquid ejection system includes a liquid chamber in fluidic communication with a nozzle. The liquid chamber contains liquid under pressure sufficient to eject a liquid jet through the nozzle. A drop formation device is associated with the liquid jet. The drop forming device is actuatable to produce a modulation in the liquid jet to selectively cause portions of the liquid jet to break off into one or more pairs of drops traveling along a path. Each drop pair is separated on average by a drop pair period. Each drop pair includes a first drop and a second drop. The drop formation device is also actuatable to produce a modulation in the liquid jet to selectively cause portions of the liquid jet to break off into one or more third drops traveling along the path separated on average by the same drop pair period. The third drop is larger than the first drop and the second drop. A charging device includes a charge electrode associated with the liquid jet and a source of varying electrical potential between the charge electrode and the liquid jet. The source of varying electrical potential provides a waveform that includes a period that is equal to the period of formation of the drop pairs or the third drops, the drop pair period. The waveform also includes a first distinct voltage state and a second distinct voltage state. The charging device and the drop formation device are synchronized to produce a first charge to mass ratio on the first drop of the drop pair, a second charge to mass ratio on the second drop of the drop pair, and a third charge to mass ratio on the third drop. The third charge to mass ratio is substantially the same as the first charge to mass ratio. A deflection device causes the first drop of the drop pair having the first charge to mass ratio to travel along a first path, and causes the second drop of the drop pair having the second charge to mass ratio to travel along a second path, and causes the third drop having a third charge to mass ratio to travel along a third path. The third path is substantially the same as the first path.

9. 发明授权

EP2699426B1 ALUMINUM SUBSTRATES AND LITHOGRAPHIC PRINTING PLATE PRECURSORS 有权
公开(公告)号：EP2699426B1
公开(公告)日：2018-08-15
申请号：EP12712876.7
申请日：2012-04-04
申请人： Eastman Kodak Company
发明人： HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , BLUM, Oliver, R. , NIELINGER, Michael
IPC分类号： B41N3/03 , B41C1/10 , G03F7/11
CPC分类号： B41N3/036 , B41C1/1008 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/12 , B41C2210/14 , B41C2210/24 , B41C2210/262
摘要： Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.

10. 发明授权

EP3042241B1 METHOD OF FORMING CONDUCTIVE FILMS WITH MICRO-WIRES 有权
公开(公告)号：EP3042241B1
公开(公告)日：2018-07-25
申请号：EP14758766.1
申请日：2014-08-21
申请人： Eastman Kodak Company
发明人： WANG, Yongcai , LEBENS, John Andrew , WRIGHT, Mitchell Lawrence
IPC分类号： G03F7/00
CPC分类号： H01B13/0013 , G03F7/0002 , G03F7/038 , H01B1/02 , H01B13/003 , H01B13/0036 , H01B13/30 , Y10T428/24917
摘要： A pattern of conductive micro-wires as in a conductive pattern can be prepared using photo-lithography, or imprint technology. A photocurable composition is cured to form a pattern of photocured micro-channels. A conductive composition comprising metal nano-particles is added to the photocured micro-channels and excess conductive composition outside the photocured micro-channels is removed. The conductive composition in the photocured micro-channels is then dried at a temperature of less than 60° C. The dried conductive composition in the photocured micro-channels is treated with hydrogen chloride vapor to form conductive micro-wires in the photocured micro-channels at a temperature of less than 60° C. The outer surface of the conductive micro-wires is then polished in the presence of water, to form a micro-wire pattern.

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